A panel of internationally renowned scientists discuss the latest results in plasma technology. This volume has been compiled with both a didactic approach and an overview of the newest achievements for industrial applications. It is divided into two main sections. One is focused on fundamental technology, including plasma production and control, high-pressure discharges, modeling and simulation, diagnostics, dust control, and etching. The section on application technology covers polymer treatments, silicon solar cell, coating and spray, biomaterials, sterilization and waste treatment, plasma propulsion, plasma display panels, and anti-corrosion coatings. The result is an indispensable work for physicists, chemists and engineers involved in the field of plasma technology.

Professor Riccardo d'Agostino is director of the Department of Chemistry at the University of Bari, Italy. His research is focused on low pressure plasma processes and diagnostics for the modification of materials. During is career, he authored 180 scientific papers and edited four books and three international proceedings. His memberships include the managing committee of Plasma Science Technique Division of IUVSTA and, as chairman, the IUPAC Committee on "Plasma Chemistry" (1989-1991). He served as co-editor of the journal Plasmas and Polymers (until 2003) and chaired numerous international conferences. Professor Pietro Favia is Associate Professor of Chemistry and Chemistry of Materials at the Department of Chemistry, University of Bari, Italy. During his career he focused on low pressure plasma processes, plasma diagnostics and surface characterization techniques. He authored about 100 papers, acted as editor of two books and served in many organizing and scientific committees of renowned international conferences on Plasma Chemistry. Professors Favia and d'Agostino are the two editors in chief of the journal Plasma Processes and Polymers (PPP). The coeditors, Professors Farzaneh ArefiKonsari, Yoshinobu Kawai, Noriyoshi Sato, Hideo Ikegami, are also experienced plasma researchers. They are responsible for subareas within the monograph, on which they have concentrated in their respective careers.

Basic Approaches to Plasma Production and Control N. Sato Plasma Sources and Reactor Configurations P. Colpo Simulations for Low-Temperature Plasma Applications J. K. Lee Modeling and diagnostics of He discharges for treatment of polymers D. Mataras 3-D Modelling of Thermal Plasmas (RF and Transferred Arc) for the Design of Sources and Industrial Processes E. Ghedini RF Plasma Sources for Semiconductor processing F. F. Chen Advanced Plasma Diagnostics for Thin Film Deposition R. Engeln Plasma Processing of Polymers by a Low-Frequency Discharge with Asymmetrical Configuration of Electrodes F. Arefi-Khonsari and M. Tatoulian Fundamentals on plasma deposition of fluorocarbon films A. Milella Plasma CVD processes for thin film Si solar cells A. Matsuda VHF Plasma Production for Solar Cells Y. Kawai Growth Control of Clusters in Reactive Plasmas and Its Application to High-stability a-Si Film Deposition Y. Watanabe Micro- and Nano-Structuring in Plasma-Processes for Biomaterials: Micro- and Nano-Features as Powerful Tools to Address Selective Biological Responses E. Sardella Chemical Immobilization of Biomolecules on Plasma Modified Substrates for Biomedical Applications L. C. Lopez In Vitro Methods to Assess the Biocompatibility of Plasma Modified Surfaces M. Nardulli Cold gas plasma in biology and medicine E. Stoffels Mechanisms of Sterilization and Decontamination of Surfaces by Low Pressure Plasma F. Rossi Application to Atmospheric Pressure Glow Plasma M. Kogoma Hydrocarbon and fluorocarbon thin films deposition in atmospheric pressure glow dielectric barrier discharges F. Fanelli Remark on Production of Atmospheric Pressure Non-Thermal Plasmas for Modern Application R. Itatani Present status and Future of Color Plasma Display T. Shinoda Characteristics of PDP Plasmas H. Ikegami Recent progress in plasma spray processing T. Yoshida Electrohydraulic Discharge Direct Plasma Water Treatment Processes J.-S. Chang Development and Physics Issues of an Advanced Space Propulsion M. Inutake